Yashowanta N Mohapatra

Professor Emeritus


Curriculum vitae



+91 512 259 7033


Physics

IIT Kanpur

Department of Physics
IIT Kanpur
Kanpur - 208016
India



Influence of hydrogen plasma treatment on boron implanted junctions in silicon


Journal article


S. Rangan, M. Horn, S. Ashok, Y. N. Mohapatra
2003

Semantic Scholar DOI
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Cite

APA   Click to copy
Rangan, S., Horn, M., Ashok, S., & Mohapatra, Y. N. (2003). Influence of hydrogen plasma treatment on boron implanted junctions in silicon.


Chicago/Turabian   Click to copy
Rangan, S., M. Horn, S. Ashok, and Y. N. Mohapatra. “Influence of Hydrogen Plasma Treatment on Boron Implanted Junctions in Silicon” (2003).


MLA   Click to copy
Rangan, S., et al. Influence of Hydrogen Plasma Treatment on Boron Implanted Junctions in Silicon. 2003.


BibTeX   Click to copy

@article{s2003a,
  title = {Influence of hydrogen plasma treatment on boron implanted junctions in silicon},
  year = {2003},
  author = {Rangan, S. and Horn, M. and Ashok, S. and Mohapatra, Y. N.}
}


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